贾子凡,宋建宇,肇伟懿.NaOH溶液浓度对激光刻蚀多晶硅片表面织构的影响[J].井冈山大学自然版,2019,40(2):83-86 |
NaOH溶液浓度对激光刻蚀多晶硅片表面织构的影响 |
INFLUENCE OF NAOH SOLUTION CONCENTRATION ONTHE SURFACE TEXTURE OF MULTICRYSTALLINE SILICON BY LASER ABLATION |
投稿时间:2018-12-03 修订日期:2019-01-15 |
DOI:10.3969/j.issn.1674-8085.2019.02.015 |
中文关键词: 表面织构 激光刻蚀 太阳能电池多晶硅片 溶液浓度 |
英文关键词: surface texturation laser etching multicrystalline silicon solar cell solution concentration |
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中文摘要: |
利用扫描电镜表征硅片样品的表面形貌,用光谱仪测试硅片的反射率,并且用少子寿命测试系统测试硅片电学性能,研究了在进行多晶硅太阳能电池表面织构过程中NaOH溶液浓度对其的影响,结果表明:NaOH溶液浓度选择10%时,有效清除多晶硅片表面缺陷的同时,硅片表面织构减反射效果显著,并能兼顾硅片电学性能。 |
英文摘要: |
This paper uses scanning electron microscopy to characterize the surface morphology of silicon wafer samples,tests the reflectivity of silicon wafers by using a spectrometer,and tests the electrical properties of silicon wafers with a minority lifetime test system.The influence of NaOH solution concentrationon surface texture of multi-crystalline silicon solar cells prepared by laser ablation are investigated.The result shows that when lye concentration is 10%,the surface defects of multi-crystalline silicon could be removed,and the surface reflectivity of multi-crystalline silicon decreased significantly while giving consideration to electrical properties of multi-crystalline silicon. |
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