胡强林,周身林,余晓光,罗小兵.超强脉冲激光在密度递增等离子体中自聚焦的PIC模拟[J].井冈山大学自然版,2016,(3):20-24 |
超强脉冲激光在密度递增等离子体中自聚焦的PIC模拟 |
THE PIC SIMULATION OF THE SELF-FOCUSING OF ULTRA-INTENSE PULSE LASER IN PLASMA WITH RAMPED DENSITY PROFILE |
投稿时间:2015-12-16 修订日期:2016-01-15 |
DOI:10.3969/j.issn.1674-8085.2016.03.005 |
中文关键词: PIC粒子模拟 等离子体 超强激光脉冲 自聚焦 |
英文关键词: PIC simulation plasma ultra-intense laser pulse self-focusing |
基金项目:国家自然科学基金项目(51461020,11064005);江西省原子与分子物理重点学科项目(2011-2015) |
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中文摘要: |
采用Epoch代码模拟研究了强度达到1022 Wcm-2的激光脉冲,在密度递增等离子体中的自聚焦过程。模拟结果表明,在此过程中,脉冲先经历成丝过程,然后光丝快速汇聚,形成聚焦;在聚焦过程中,可产生超陡脉冲激光,脉冲峰值强度与初始脉冲峰值强度相比可提高近20倍,达到1023 Wcm-2量级。 |
英文摘要: |
The self-focusing process of ultra-intense pulse, peak intensity up to 1022 Wcm-2, in plasma with ramped density profile is simulated using Epoch code. The simulation results shows that in the process, the pulse experiences a filamentation instability process first, and then the filament gathered quickly and forming the focus. In this process, a super steep pulse is formed, and the peak intensity enhanced almost 20 times higher than the peak intensity of the initial pulse, and reach to the order of 1023 Wcm-2. |
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